V:YAG (Yttrium-Aluminum Garnet doped with three-valence vanadium V3+) is a relatively new crystal material of saturable absorbers and passive Q-switch in the spectral range from 1064 to 1440 nm, primarily because of extremely high ground-state absorption cross section and negligible excited-state absorption around the absorption peak at about 1300 nm. This material, revealing excellent optical, mechanical, and thermal properties, can typically be grown by the Czochralski method. V:YAG crystals have been applied for a variety of active media such as Nd:YAG, Nd:YAP, Nd:KGW, Nd:YVO4 to achieve compact and good-performance passive Q-switching lasers.
Features
Extremely high ground state absorption
Negligible excited state absorption
High contrast of Q-switch
Good optical, mechanical, and thermal properties
UV resistant and high High damage threshold(>500MW/cm2)
Applications
Q-switching and model-locking for Nd:YAG lasers
Q-switching and model-locking for Nd:YAP lasers
Q-switching and model-locking for Nd:KGW lasers
Q-switching and model-locking for Nd:YVO4 lasers
Parameters
|
Property
|
Value
|
|
Chemical formula
|
V3+:Y3Al5O12
|
|
Crystal structure
|
cubic - la3d
|
|
Orientation
|
<100> <+/-0.5°
|
|
Transmittance
|
30%-97%
|
|
Opticaldensity
|
0.1-0.8
|
Specifications
|
Property
|
Value
|
|
Atomic transition structure
|
Two-levelsystem
|
|
Recovery time
|
5~2210-22s
|
|
Concentrations
|
(0.05~0.35)wt%
|
|
Absorptioncross-section
|
7.3×10-18cm2 (@ 1340 nm)
|
|
Emissionbandwidth
|
1000-1450 nm
|
|
Centralabsorption wavelength
|
1300nm
|
|
Coatings
|
Standardcoating is AR with R < 0.2% (@1340 nm)
|
Polishing Specification
|
Property
|
Value
|
|
OrientationTolerence
|
<0.5°
|
|
Thickness/DiameterTolerance
|
±0.05mm
|
|
SurfaceFlatness
|
</8@632nm
|
|
WavefrontDistortion
|
</4@632nm
|
|
SurfaceQuality
|
10/5
|
|
Parallel
|
30
|
|
Perpendicular
|
15
|
|
ClearAperture
|
>90%
|
|
Chamfer
|
<0.2×45°
|
Standard products
|
Initial transmission @1064nm
|
Dimensionsmm
|
Coatings
|
SurfaceFlatness
|
SurfaceQuality
(scratch/dig)
|
|
T0=30%
|
dia 5
|
AR≤0.2% @1064nm
|
</8@632 nm
|
10/5
|
|
3x3
|
|
5x5
|
|
T0=40%
|
dia 5
|
|
3x3
|
|
5x5
|
|
T0=50%
|
dia 5
|
